Fidelity of Photo-nanoimprint
نویسندگان
چکیده
منابع مشابه
Pattern transfer fidelity of nanoimprint lithography on six-inch wafers
We studied the pattern transfer fidelity of nanoimprint lithography (NIL) by patterning sub-micron MESFET gates on six-inch wafers. The critical dimensions (CD) of the gate patterns on the mould, imprinted in resist, as well as after oxygen reactive ion etching (RIE) and metal lift-off were measured, separately, using an ultrahigh-resolution scanning electron microscope. Comparison of the measu...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2005
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.18.537